PRODUCTS
Product Details
Silicon Dioxide polishing slurry is a colloidal or nanoparticle-based suspension used in the final polishing stage for achieving ultra-smooth, scratch-free surfaces—especially critical in:
MT, MPO, MTP ferrules
Optical connectors
Glass substrates
Semiconductors
Ceramic and photonic components
Preparation
Use with ultra-fine SiO₂ polishing film (0.1 µm or 0.02 µm)
Clean ferrules thoroughly after pre-polishing steps
Make sure polishing surface is clean and dust-free
Apply the Slurry
Shake the bottle well to disperse particles
Dispense a few drops (3–5mL) onto the polishing film
Spread evenly across the pad or film
Polishing
Use a polishing jig (MT/MPO holder)
Light, even pressure: 2000–7000 g
Duration: 60–120 seconds
Motion: figure-8, circular, or orbital
Optional: Add deionized water if slurry dries during polishing
Cleaning
Rinse polished ferrules with DI water or alcohol
Blow dry with filtered air
Clean pad or film between each connector
Inspection
Use interferometer or 400x scope
Confirm:
No scratches
Perfect apex radius
Correct fiber height
Clean core/cladding face
Always use fresh slurry for each batch
Never mix with other abrasive types
Avoid polishing too long (can round fiber edges)
Store slurry in a sealed bottle in a cool, dry place
Clean and inspect between each polishing stage
With proper use of Silicon Dioxide polishing slurry, you’ll achieve:
Low insertion loss
Superior return loss
Highly reliable MPO/MTP trunk cable endfaces
Compliance with MSDS, IEC, Telcordia, and GR-326 core specs
Would you like:
A detailed process sheet for mass MPO/MTP polishing?
A recommendation for SiO₂ slurry or polishing film?
Let me know — I can customize it for your production setup!
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